Realize your nano vision

Bengt Nilsson

     Bengt Nilsson

Processing competence: Has 20 years experience and expertise in electron beam lithography processing and process optimization in deep sub-micron range, as well as in interaction with lab users and project planning. Pattern data and job file pre-processing for e-beam exposure, proximity effects compensation based on experimental and theoretical proximity function evaluation. Sub-micron pattern transfer by wet and dry plasma/ion etching. State-of-the-art sub-20nm negative and positive pattering by electron beam lithography.

Tel: +46 31 772 84 80

Mobile: +46 70-3088318

List of tools where Bengt Nilsson is tool responsible


 NameTypeTool Id
DetailsEBL - JEOL JBX 9300FSElectron beam Lithography217
DetailsEBL Sample pre-aligner 242
DetailsMask aligner - Canon PPC-210Mask aligner1117
DetailsSoftware - Proxecco proximity correction 1400
DetailsSoftware - GenISys BEAMER 1410
DetailsSoftware - GenISys LAB 1411
DetailsMaskless lithography - SmartPrint 1121