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Myfab

Realize your nano vision

All tools

Resources at your disposal

The Electrum Laboratory maintains a multitude of laboratories, covering most aspects of nano and microtechnology. In our flexible facilities both single samples and batches are equally welcome. We handle separate steps to full sequences in fabrication and characterization. We offer access to sophisticated software for calculation and simulation. Our personnel are available to help you to master the wide world of nano and microtechnology.

Full process lines and characterization resources

In our cleanroom we maintain full process lines for Silicon CMOS, MEMS and compound semiconductors, including GaAs, InP and SiC. We also offer access to a wide variety of techniques for characterization of materials and devices.

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(Extract from LIMS)
 NameManufacturerModelCategoryArea nameCurrent toolratetype name
DetailsExternal chemistry labN/AN/AOther processesY-External chemistry labA
Details5175 DS-1burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
DetailsPlasmatvätt PicoDiener PICO RFLow pressure plasma etcherDry etchingC-HybridiseringB
DetailsFH MS OlympusLabrum klimatLAFDevice mountingC-HybridiseringA
DetailsFH MS NikonLabrum klimatLAFDevice mountingC-HybridiseringA
DetailsSSE SprayetsSSESprayetsWet process benchesC-HybridiseringA
DetailsBonderKarl SussCB8 Substrate BonderDevice mountingC-Gul 1C
DetailsKarl SussKarl SussMask aligner MA8/BA8LithographyC-Gul 1C
DetailsMaximusSSEMaximus 804LithographyC-Gul 1C
DetailsICPSTSICP DRIE (Si, SiO2)Dry etchingC-Si-metalD
DetailsKDFKDF844GTThin film depositionC-Metal-III/VD
DetailsRIEPlasmalab System 100RIE of thin films (Si3N4 & SiO2)Dry etchingC-Si-metalD
DetailsALOES Advanced Oxide EtcherSTSICP AOE (DRIE)Dry etchingC-STS-labD
DetailsFiber annealÅngpaneföreningenSpecial designOther processesC-APLA
DetailsDisco-sawDiscoDAD3241SawingC-DISCO sawD
DetailsDisco cleanerDiscoDCS1441SawingC-DISCO sawB
DetailsRakelDage Precima InternationalRakelDevice mountingY-yttrelabB
DetailsLab supportELABVirtual toolOther processesVirtualA
DetailsEmmaKarl SussMA6/BA6LithographyC-Gul 3C
DetailsHMDS 2IMTECStar 2000 (HMDS)LithographyC-Gul 3A
DetailsArielOxford Plasma TechnologyPlasmalab80Plus (Oxford RIE System)Dry etchingC-Q-EtchD
DetailsGallusOxford InstrumentICP380 Etch System (GaAs & InP)Dry etchingC-Q-EtchE
DetailsM07 Olympus/cameraOlympusMicroscopeSurface analysis & TEMC-Q-EtchA
DetailsR/D 3VerteqVerteqWet process benchesC-Q-EtchA
DetailsFH III/VPM PlastDragskåpWet process benchesC-Q-EtchA
DetailsBertilWest Bond 7476E-79 Manual Wedge-Wedge Wire BonderDevice mountingN-MeasurementB
DetailsTencor P10TencorSurface profiler Tencor-P10MetrologyY-Synth labsA
DetailsW2631Wet benchWet bench spray etch (GaAs).Wet process benchesC-Q-EtchA
DetailsW3233Wet benchWet bench lift off.Wet process benchesC-Q-EtchA
DetailsTegalPlasmalineB300RF Dry etchingC-Q-EtchB
DetailsLEITZLEITZ MPV-SPThin film interferometry, MetrologyC-AnnealA
Details4-PointFour Dimensions, IncModel 280MetrologyC-AnnealA
DetailsActivatorCentrothermActivator 150 (SiC anneal)Thermal processesC-AnnealD
DetailsDektakSTDektak3STMetrologyC-APLB
DetailsCD SEMHitachiS-3400N & EDS QUANTAX 200Surface analysis & TEMC-RIBEC
DetailsM02 Olympus/cameraOlympusBX60Surface analysis & TEMC-APLA
DetailsM03 LeicaLeicaMicroscopeSurface analysis & TEMC-APLA
DetailsRinser 1VerteqVerteqWet process benchesC-APLA
DetailsUVO CleanerJelight COmpany, Inc42-220Sample prepC-APLA
DetailsFH APLFume hoodFume hoodWet process benchesC-APLA
DetailsIBSCommonwealth Scientific CorporationIon Beam Sputtering ToolThin film depositionC-Metal-III/VD
DetailsM01 OlympusOlympusBX60MSurface analysis & TEMC-APL-gulA
DetailsRinser 2VerteqVerteqWet process benchesC-APL-gulA
DetailsBake 7MemmertUM 100 bakeLithographyC-APL-gulA
DetailsFH APL-gulPM PlastDragskåpLithographyC-APL-gulA
DetailsAPL-HMDSYES-5E Vacuum Bake / Vapour Prime Processing SystemLithographyC-APL-gulA
DetailsWetb APL-gulWet benchWet benchWet process benchesC-APL-gulA
DetailsAPL spinnerBLEBuilt inLithographyC-APL-gulB
DetailsBake 2Bake oven DespatchPre and postprocessing of samplesLithographyC-APL-gulA
DetailsBake 3Bake oven MemmertPre and postprocessing of samplesLithographyC-APL-gulA
DetailsNSRNikonTFHi12LithographyC-Gul 1E
DetailsM10 Nikon/autoNikonMicroscope (motorized objectives)Surface analysis & TEMC-RIBEA
DetailsALS-stepperGCA/UltratechALS 2035 G-lineLithographyC-APL-CenturaE
DetailsM11 Nikon/CD 1NikonOPTISHOT/LinjebreddsmätareMetrologyC-RIBEA
DetailsManual probstationSuss Microtech10500006 (probe station)MetrologyC-RIBEA
DetailsQuicksealQuicksealInplastningOther processesC-APLA
DetailsRTAMattson100 RTP SystemsThermal processesC-AnnealD
DetailsEpsilon2000ASM200Si-epiEpitaxyC-Si-epiE
DetailsBalanceBalanceVågOther processesC-Si-epiA
DetailsHB16-TPTTPTHB16Device mountingY-ES-lab 3390C
Details5269 DS-1burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-2burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-3burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-4burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-5burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-6burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5269 DS-7burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
DetailsALDBENEQTFS200Thin film depositionC-AnnealC
DetailsUVISELHORIBAUVISEL ERMetrologyC-AnnealB
DetailsIDPExpertechLPCVD furnaceThin film depositionC-APLC
DetailsCenturaApplied MaterialsCentura II (DPS & MxP)Dry etchingC-APL-CenturaD
DetailsP5000Applied MaterialsPrecision 5000 Mark II (Dielectric, MxP, CVD)Dry etchingC-Si-metalD
DetailsEnduraApplied MaterialsPVDThin film depositionC-Si-metalE
DetailsBarbaraProvacPAK 600 Coating SystemThin film depositionC-Metal-III/VD
DetailsIndiraBalzersBA 510 Thermal EvaporatorThin film depositionC-Metal-III/VD
DetailsEdvardEdvards160Thin film depositionC-Metal-III/VD
DetailsBlästerGuyson Europlast4 SF-Select (med inställbar hjöd) samt utsugningsfOther processesY-yttrelabA
DetailsLäppusLogitech50 Precision Lapping & Polishing MachineOther processesC-CMPB
DetailsLabspin80Suss MicrotecLabspin8-BMLithographyC-Gul 3B
DetailsWetb SabinaPM Plast2 HP, Developer, SinkWet process benchesC-Gul 3A
DetailsW34Wet benchWet bench LithografiWet process benchesC-Gul 3A
DetailsFH Gul3PM PlastDragskåpLithographyC-Gul 3A
DetailsKyl & frysElectroluxKylskåp/frysOther processesC-Gul 3A
DetailsArnoldSSE spincoaterOPTISPIN SST20LithographyC-Gul 3B
DetailsBake 4MemmertU 26LithographyC-Gul 3A
DetailsBake 5MemmertU 26Thermal processesC-Gul 3A
DetailsBake 6MemmertULM 400LithographyC-Gul 3A
DetailsYes-ugnYESPolyimide Bake Oven YES-450PB8-2/6-2Thermal processesC-Gul 3C
DetailsM04 LeitzLeitzLABORLUX 12 HLSurface analysis & TEMC-Gul 3A
DetailsM05 Nikon/autoNikonMicroscopeSurface analysis & TEMC-Gul 3A
DetailsEsaOxford Plasma SystemPlasmalab80Plus (Oxford RIE System) Chamber BDry etchingC-Q-EtchD
DetailsFabioOxford InstrumentICP380 Etch SystemDry etchingC-Q-EtchD
DetailsTeplaTePla300 (Microwave Plasma Asher)Dry etchingC-Q-EtchB
DetailsPekkaPlasmalab80Plus (Oxford PECVD System) Chamber AThin film depositionC-Q-EtchD
DetailsPeoPEOPEO-603 Anneal furnace III/V (ramp)Thermal processesC-Q-EtchB
DetailsAFM AcreoDigital Instruments (Veeco)Atomic Force MicroscopeMetrologyN-MeasurementC
DetailsHR X-RayX-RayX-RayMetrologyY-HR X-rayB
DetailsAsterixAixtron AIX 200/4MovpeEpitaxyC-Epi-III/VE
DetailsCleanroomElectrumElectrum LaboratoryOther processesVirtualA
DetailsESEC Automatic WirebonderESEC3100 plusDevice mountingY-Bonder roomC
DetailsDisco DAD sawDiscoDAD 320SawingY-External chemistry labB
DetailsTLE labTanner15.10Other processesN-MeasurementA
DetailsCritical Point Dryer AlbanovaLeicaEM CPD 300Other processesAlbanova C1:3052D
Details3D MF ProbestationIn-houseMedium Field MR and RF Probe StationMetrologyY-yttrelabC
DetailsHF ProbestationIn-houseHigh Field RF Characterization StationMetrologyY-yttrelabC
DetailsCanon EOS 350DCanonEOS 350D 100mm MacroSurface analysis & TEMC-AnnealA
DetailsManual spray coaterHome madev1LithographyC-Gul 1A
DetailsLaboratory ovenHereausBench ovenSample prepY-SEM labsA
DetailsFE-TEMJEOLJEM 2100F(HR), JEOL Electron Microscope 2100 FieldSurface analysis & TEMY-SEM labsD
DetailsFIB-SEMFEIQUANTA 3D FEG Surface analysis & TEMY-SEM labsD
DetailsPreparation labCollection of toolsTools for sample preparationSample prepY-SEM labsB
DetailsPlasma cleanerFischionePlasma cleanerSample prepY-SEM labsA
DetailsGold sputter FNMJEOLIon sputter JFC-1100Sample prepY-SEM labsA
DetailsDiamond sawBuehlerIsomet low speed sawSample prepY-SEM labsA
DetailsGrinder-polisherBuehlerVector/AlphaSample prepY-SEM labsA
DetailsUltrasonic disc cutterGatanModel 601Sample prepY-SEM labsA
DetailsDimple grinderGatanDimple grinderSample prepY-SEM labsA
DetailsElectrolyte polishingFischioneElectrolyte polishingSample prepY-SEM labsA
DetailsIon polishingGatanPrecision ion polishing 691Sample prepY-SEM labsA
DetailsGeminiZeiss Ultra 55Surface analysis & TEMY-SEM labsC
DetailsTwo speed grinder-polisherBUEHLERAlphaSample prepNano-Lab 3167A
DetailsPrecision ion polishing systemGatanmodel 691Sample prepNano-Lab 3167A
DetailsPotentiostat / Galvanostat - ZRAGAMRY InstrumentsVistsShield/Interface 1010MetrologyAlbano Hus 3, 3133A
DetailsFreeze DryerIlshin LabIlshinMetrologyAlbano Hus 3, 3133A
DetailsDifferential scanning calorimetry (DSC)TA Instruments2920 modulated DSCMetrologyAlbano Hus 3, 3133C
DetailsThermogravimetry Analysis (TGA)TA InstrumentsTGA Q500MetrologyAlbano Hus 3, 3133C
DetailsUV-Vis-NIR SpectrometerPerkin ElmerLambda-750MetrologyAlbano Hus 3, 3133B
DetailsRotational ViscometerAnton PaarVisco QC 100MetrologyAlbano Hus 3, 3133A
DetailsM20 MicroscopeNanometricsMicroscopeSample prepAlbano Hus 3, 3133A
DetailsProbestation 3 Semi AutomaticCascade MicrotechCascade 12000MetrologyY-Electrical characterizationB
DetailsProbestation 1 ManualCascade11000MetrologyY-Electrical characterizationA
DetailsProbestation 4 High Temp.SignatoneS-1060MetrologyY-Electrical characterizationA
DetailsLäcksökarenPfeiferQualyTest HLT260Other processesC-SlussA
DetailsMasktvättUltra t Equipment Company, Inc.SCS 124LithographyC-Gul 1A
DetailsCryogenic ProbestationJanisST-500-UHTMetrologyN-MeasurementC
DetailsFTIR SpectrometerBrukerVortex 70 VMetrologyN-MeasurementC
DetailsPrometeus manualKarl Suss and Temptronic TermoChuck SystemManual Probestation PM 5, TP0314AMetrologyN-MeasurementB
DetailsPrometeus autoKarl Suss and Temptronic TermoChuck SystemAutomatic Probestation PA 150 and TP03215B-3300-2MetrologyN-MeasurementC
DetailsLPE 106LPEPE106EpitaxyC-Si-epiE
DetailsWetb Si stripWet bench developerPhotoresist processing.Wet process benchesC-Gul 1A
DetailsWetb Au developWet benchWet benchWet process benchesC-Gul 1A
DetailsR/D Gul1FSI PhoenixFSI Phoenix 4"Wet process benchesC-Gul 1A
DetailsWetb-Si epi-cleanWet bench CleanWet bench Clean and IMECWet process benchesC-Si-epiA
DetailsW0607Wet bench HF cleanWet bench HF clean and HF dopedWet process benchesC-Si-epiA
DetailsR/D 2VerteqVerteq 4"Wet process benchesC-Si-epiA
DetailsKemvåg??MetrologyC-Wet ChemistryA
DetailsWetb Si processWet bench oxideWet bench oxide,HF 1:10,BHF,HFmixWet process benchesC-Wet ChemistryA
DetailsWetb MEMSWet benchTMAH, HF, KOHWet process benchesC-Wet ChemistryA
DetailsWetb metalWet benchAu/metal etchWet process benchesC-Wet ChemistryA
DetailsWetb solventWet benchRemover, Vax, Au moduleWet process benchesC-Wet ChemistryA
DetailsSkivthkMitutoyoRDP transducer indicator E307-1MetrologyC-Wet ChemistryA
DetailsR/D doubleSemitoolSemitool Double 870SWet process benchesC-Wet ChemistryA
DetailsFH ServicePM plastFume hood for serviceWet process benchesC-Wet ChemistryA
DetailsWetb Al etchWet benchEtchingWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-7PM PLastDragskåpWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-8PM PlastDragskåpWet process benchesC-Wet ChemistryA
DetailsFH epi servicePM PlastDragskåp för epi rengöringWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-2 (solvent)PM PlastDragskåp solventWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-3PM PlastDragskåp solvent and acidWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-4PM PlastDragskåp solventWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-5 (solvent)PM PlastDragskåp solventWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-6PM PlastDragskåp solventWet process benchesC-Wet ChemistryA
DetailsWetb Solvent cleanWet bench Substrate cleaningWet process benchesC-Wet ChemistryA
DetailsFH wet chemistry-1PM PlastDragskåp solvent & acid (for service work)Wet process benchesC-Wet ChemistryA
DetailsR/D MetalsSemitoolSemitool 4" MetalsWet process benchesC-Wet ChemistryA
DetailsR/D GoldFSI PhoenixFSI Phoenix 4" Au/Lift-OffWet process benchesC-Wet ChemistryA
DetailsMegasonic bathPCTPCT 24 wet benchWet process benchesC-CMPA
DetailsCMPIPEC / AxusAvanti 472Other processesC-CMPD
DetailsSSECVeccoSSEC 3300Wet process benchesC-RIBEA
DetailsFTP500FTPInterferometerMetrologyC-APLA
DetailsWetb APLWet benchWet benchWet process benchesC-APLA
DetailsRörtvättKTHhandmadeOther processesY-yttrelabA
DetailsGammaSuss MicrotecGamma 4MLithographyC-APL-CenturaC
DetailsMS02 NikonNikonStereo microscope SMZ-2TSurface analysis & TEMC-STS-labA
DetailsM13 Nikon/cameraNikonNikonSurface analysis & TEMC-STS-labA
DetailsM14 Olympus/cameraOlympusBX60Surface analysis & TEMC-Si-metalA
DetailsTesttoolTest AB eller OYStandardOther processesVirtualA
DetailsM08 Leitz/cameraLeitzMicroscope with cameraSurface analysis & TEMC-Wet ChemistryA
DetailsM09 Nikon/cameraNikonMicrosocpe with cameraSurface analysis & TEMC-Wet ChemistryA
DetailsMS01 NikonNikonStereo microscope SMZ-2BSurface analysis & TEMC-Wet ChemistryA
DetailsLIMSElabAccessOther processesVirtualA
DetailsTesttool ElectrumElectrum labmodel 1MetrologyVirtualA
DetailsRoomRElabresponsibleOther processesVirtualA
DetailsRenrumElabAccessOther processesVirtualA
DetailsT1-Oxide 1250CThermco5200Thermal processesC-APLB
DetailsT2-Oxide 1250CThermco5200Thermal processesC-APLB
DetailsT3-Gate oxThermco5200Thermal processesC-APLB
DetailsT4-FGAThermco5200Thermal processesC-APLB
DetailsAFM/SSRMVeeco/Digital InstrumentsNanoScope Dimension 3100MetrologyY-3283 Saw roomB
DetailsOpt. micr. 3, AlbanovaNikonEclipse L200Surface analysis & TEMAlbanova C1:3049A
DetailsOpt. micr. 1, AlbanovaNikonME600Surface analysis & TEMAlbanova C1:3052A
DetailsOpt. micr. 2, AlbanovaNikonME600Surface analysis & TEMAlbanova C1:3052A
DetailsOpt. Profiler AlbanovagbsSmartVIS 3DMetrologyAlbanova E1:1015AC
DetailsOpt. micr. 4, fluorescence, AlbanovaNikonME600 w. fluorescence unitSurface analysis & TEMAlbanova E1:1017AA
DetailsMicrowave/THz Probe StationMSTMST LabMetrologyY-MSTB
DetailsZVA-24 Vector Network AnalyzerMSTMST LabMetrologyY-MSTD
DetailsDynatronix Pulse Power SupplyDynatronixDuPR10-.1-.3XRMetrologyY-MSTA
DetailsPXINational InstrumentsNI PXI-1033 SeriesMetrologyY-MSTA
DetailsCIPTSmartipCIPTechMetrologyY-yttrelabC
DetailsAGMPrinceton Measurement Corporation2900-02 Alternating Gradient MagnetometerMetrologyY-yttrelabC
DetailsKarl Suss MJB3 AlbanovaKarl SussMJB3LithographyAlbanova C1:3049C
DetailsFIB/SEM AlbanovaFEI CompanyNova 200Surface analysis & TEMAlbanova E1:1015AD
DetailsWire bonder AlbanovaKulicke - Soffa4523DDevice mountingAlbanova E1:1017AA
DetailsProfiler AlbanovaKLA-TencorP7MetrologyAlbanova C1:3052B
DetailsMicro Diamond Scriber, AlbanovaOEG GmbHMR-200Device mountingAlbanova C1:3049B
DetailsMaskless litho AlbanovaSmartForce TechnologiesSmartPrintLithographyAlbanova C1:3049C
DetailsAFM/SPM Nanow.JPK2 AlbanovaJPK InstrumentsNanowizard 3MetrologyAlbanova E1:1019AC
DetailsAFM/SPM CellKraft Humidifier AlbanovaCellKraftP2MetrologyAlbanova E1:1019AA
DetailsAFM/SPM IPS Bipotentiostat AlbanovaIPSPGU-BI 1000MetrologyAlbanova E1:1019AA
DetailsSPM/AFM Icon AlbanovaBrukerDimension IconMetrologyAlbanova E1:1019AC
DetailsSPM/AFM FastScan AlbanovaBrukerDimension FastScanMetrologyAlbanova E1:1019AC
DetailsSPM/AFM Nanowizard JPK AlbanovaJPK InstrumentsNanowizard 3 Bioscience AFMMetrologyAlbanova E1:1019AC
DetailsBond Tester DAGEDAGE2400PCMetrologyY-Pack labA
DetailsTencor P15TencorSurface profiler Tencor-P15MetrologyC-AnnealB
DetailsPLDNeocera IncNeocera Pioneer 180 UHV PLDThin film depositionY-Synth labsD
DetailsEmpyreanPANalytical B.V.Empyrean multipurpose high resolution X-ray diffraMetrologyY-XRD labC
DetailsVT STMOmicronOmicron VT-STMSurface analysis & TEMY-Mats-labA
DetailsSTM 1OmicronOmicron STM-1Surface analysis & TEMY-Mats-labA
DetailsUHV SPM 3500RHK TechnologyUHV SPM 3500Surface analysis & TEMY-Mats-labA
DetailsRaman Spectrometer HORIBA iHR 550HORIBA Jobin YvoniHR 550MetrologyY-Mats-labA
DetailsAJA Sputter AlbanovaAJA International Inc.OrionThin film depositionAlbanova E1:1017AD
DetailsEurovac UHV deposit, AlbanovaEurovac/ThermionicsCustom madeThin film depositionAlbanova E1:1017AD
DetailsAJA 3 Sputter AlbanovaAJA InternationalATC Orion-8Thin film depositionAlbanova E1:1017AD
DetailsHallVarian/KeithlyIn-houseMetrologyY-HR X-rayB
DetailsObelixAixtronLP-VPE 2106EpitaxyC-Epi-III/VE
DetailsBaltazar spectrometerSPECS GmbH and homemadeHomemadeMetrologyY-BaltazarE
DetailsFs Laser system 1CoherentMira 900Other processesY-Optics 3168A
DetailsFs Laser system 2Coherent and APEChameleon Ultra II + APE Harmonics generatorOther processesY-Optics 3168A
DetailsScanning near-field optical microscope (SNOM)Max Born Institute with modifications at KTHA home-made instrument Surface analysis & TEMY-Optics 3168A
DetailsTGA/FTIR InterfaceThermo Scientific--Surface analysis & TEMAlbano Hus 3, 3133C
DetailsGas Gromatography /Mass Spectrometry (GC/MS)Hewlett PackardHP 6890MetrologyAlbano Hus 3, 3313C
DetailsInductively Coupled Plasma Emission Spectrometry (ICP-OES)Thermo ScientificiCAP 6500MetrologyAlbano Hus 3, 3313C
DetailsMulti vessel dip coating unitAoxicindiaXdip.MVISample prepAlbano Hus 3, 3313A
DetailsRotavapor BÜCHIR-205Sample prepAlbano Hus 3, 3313A
DetailsLight SoakerWavelabsWavelabsOther processesAlbano Hus 3, 3313A
DetailsCentrifuge Z 200 AHERMLEZ 200 A Sample prepAlbano Hus 3, 3313A
DetailsCentrifuge Z 323HERMLEZ 323Device mountingAlbano Hus 3, 3313A
DetailsBox furnaceCARBOLITECWF 1200Thermal processesAlbano Hus 3, 3315A
DetailsOptical microscope (Leica)LEICA DMLMLeicaSample prepAlbano Hus 3, 3315A
DetailsIon Chromatography (IC)MetrohmEco ICMetrologyAlbano Hus 3, 3315C
DetailsFourier Transform Infrared (FTIR)Thermo ScientificNicolet iS10MetrologyAlbano Hus 3, 3315B
DetailsFluorescence Spectrometer (PL)Perkin ElmerLS55MetrologyAlbano Hus 3, 3315B
DetailsParticle sizer-DLS/Zeta potentialBeckman CoulterDelsa NanoMetrologyAlbano Hus 3, 3315C
DetailsRotating Tube FurnaceHeraeusthermicon PThermal processesAlbano Hus 3, 3314A
DetailsVacuum Oven B&HBuch & HalmVacuceIIThermal processesAlbano Hus 3, 3314A
DetailsUEMJEOL JEM-2100Ultrafast Electron MicroscopySurface analysis & TEMY-SEM labsE
DetailsCnCVSEMILAB210MetrologyC-Si-epiB
DetailsSentaurusSynopsysR-2020.09Other processesVirtualA
DetailsULVACULVACENVIRO-1XaLithographyC-APLD
DetailsNikon Microphot-FXANikonMicrophot-FXAOther processesY-MSTB
DetailsTheta LiteMSTMST labSurface analysis & TEMY-MSTB
DetailsSpeed mixerMSTMST labOther processesY-MSTB
DetailsCNC-milling machineMinitechMini-MillOther processesY-MSTB
DetailsParoteq Bonder AlbanovaParoteq GmbHH-systemDevice mountingAlbanova E1:1017AC
DetailsuFAB Femtosecond LaserMSTMST labOther processesY-MSTB
DetailsMLA150 AlbanovaHeidelberg Instruments GmbHMLA150LithographyAlbanova C1:3049D
DetailsRIE ICP O2/AR AlbanovaOxfordPlasmalab 80+Dry etchingAlbanova C1:3052D
DetailsBeamer computer AlbanovaGeniSys GmbHVersion 5.90LithographyAlbanova E1:1015AC
DetailsEbeam litho AlbanovaRaith GmbHRaith VoyagerLithographyAlbanova E1:1015AE
DetailsEdwards Auto 306 AlbanovaEdwardsAuto306 with FL400 chamberThin film depositionAlbanova C1:3052D
DetailsCryo RIE AlbanovaOxfordPlasmalab 100Dry etchingAlbanova C1:3052D
DetailsCPDtousimisAutomegasamdris-938Other processesC-Wet ChemistryB
DetailsBragePM PlastFume hoodWet process benchesPronano S:102B
DetailsNannaPM PlastFume hoodWet process benchesPronano S:102B
DetailsFrejAixtronFlip Top CCS MOVPE System EpitaxyPronano A:108E
DetailsParylene coaterSCSPDS 2010Thin film depositionC-STS-labB
DetailsSemlanEpigress VP508/SK SiC-VPEEpitaxyC-Epi-SiCE
DetailsNapoleonAixtronVP508GFR SiC epiEpitaxyC-Epi-SiCE
DetailsCO2 LaserUniversal Laser Inc.VSL 2.3Other processesY-MSTB
DetailsAJA 2 Sputter AlbanovaAJA International Inc.OrionThin film depositionAlbanova C1:3052D
DetailsAnnealer, vacuum, AlbanovaMoorfieldAnnealThermal processesAlbanova C1:3052D
Details5175 DS-2burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
Details5175 DS-3burdinolaOR-ST 1500Wet process benchesY-External chemistry labA
DetailsNanoscribeNanoscribe3D Microfabrication System Photonic Professional GOther processesY-MSTD
DetailsKeithley ParameteranalyserTektronix4200A-SCSMetrologyY-MSTA
DetailsOptical profilometerVeecoWyko NT9300MetrologyC-AnnealB
DetailsFrejaHitachiSU8230Surface analysis & TEMPronano A:109D

 

2020-06-30 Quality group (P)