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Thin Film Deposition |
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Thin films of metals, dielectrics and insulators are deposited on a vide variety of substrates, with high precision in thickness and composition.
Different deposition methods are used to customize the best film to your specific demands.
We offer films by sputtering, low pressure chemical vapor deposition (LPCVD), thermal and electron beam evaporation and plasma enhanced chemical vapor deposition (PECVD).
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(Extract from LIMS)