Anneal

There exist a number of high temperature processing tools in this area.

Atomic Layer Deposition (ALD) to the left deposit thin layer of different materials.   The Activator 150 to the right is a high temperature ( > 1200 °C) anneal system for SiC processing.

 There is also a Rapid Thermal Processing (RTP) system in this area where the temperature is raised to 900-1000 °C in a couple of seconds.

All pictures can be viewed in larger format, just click on them.

Return to start of Virtual Clean Room Lab Tour