Gul 3

In the photolithography area light is used to transfer a geometric pattern from a photo mask to a light-sensitive chemical photoresist on the substrate.

An EVG 620 UV Nanoimprint Lithography tool (left), mask aligner MA6/BA6 Karl Suss and a DSW g-line stepper is used for patterning the wafers. Coaters (right) are used to coat the wafers with photosensitive film.

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