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Epitaxy
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Dice mounting
Materials and Device Characterization
All tools
Process service, Electrum
Aluminium etching process
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Myfab
Myfab Chalmers
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Johan Andersson
Henrik Frederiksen
Mattias Fredriksson
Mats Hagberg
John Halonen
Karin Hedsten
Martin Karlsson
Piotr Jedrasik
Fredrik Johansson
Petra Johansson
Niclas Lindvall
Peter Modh
Bengt Nilsson
Johan Persson
Göran Reivall
Marcus Rommel
Mahdad Sadeghi
Myfab KTH
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Chalmers
//
Resources
//
All tools
All tools
Name
Manufacturer
Model
Current toolratetype name
Details
Ozone Cleaning - Novascan
Novascan
PSD-UVT
B
Details
SPM - Bruker Dimension ICON
Bruker
Dimension ICON
C
Details
Diffractometer Xray - Panalytical XPert
Panalytical
XPert PRO MRD
C
Details
CVD - Carbolite - 2D materials
Carbolite
EZS-3G 12/600B 1200C
A
Details
Transfer stage - Manual for 2D and 1D materials
?
?
A
Details
X-ray photoemission spectroscopy – Scienta Omicron
Scienta-Omicron GmbH
Argus CU
C
Details
Glove Box - 2D materials
MBRAUN
LABstar pro
B
Details
Smoltek CVD
--
--
C
Details
Software - GenISys BEAMER
GenISys GmbH
Proximity Correction
A
Details
Software - GenISys LAB
GenIsys
LAB simulation package
A
Details
Software - Proxecco proximity correction
PDF Solutions GmBH
Proxecco-7.0
B
Details
Mask aligner - Canon PPC-210
Canon
PPC-210
C
Details
Sputter - Pfeiffer
Pfeiffer Vacuum
SLS-630G "Spider"
C
Details
Sputter - AJA
AJA International
AJA Orion 6-UD
D
Details
Sputter - DCA - Quantum
DCA
MTD 620
D
Details
PLD - Carbon System
Chalmers
-
C
Details
Evaporator - Plassys
Plassys
MEB 550 S
D
Details
Evaporator - Lesker PVD 225 #2
Lesker
PVD 225
D
Details
CVD - MgB2 - PVD hybrid
Chalmers
-
C
Details
Sputter - FHR
FHR
MS150
D
Details
Sputter - NORDIKO
Nordiko
2000
B
Details
Evaporator - Varian
Varian
VT 118 UHV
C
Details
Sputter - Balzers
Balzers/Pfeiffer
PLS 550
C
Details
Evaporator - AVAC
AVAC
HVC600
C
Details
Evaporator - Edwards
Edwards
Auto 306
B
Details
PLD - Small System
Chalmers/Staffan Pehrson
Generation I
B
Details
PLD - Compex 205 Laser
Lambda-Physik
Compex 205
C
Details
PLD - Calas System
Chalmers/Staffan Pehrson
Generation III
C
Details
PLD - RHEED System
Chalmers/TSST
High pressure RHEED
C
Details
PLD - DCA Cluster
DCA Instruments
UHV PLD
C
Details
Sputter - DCA Cluster - Oxides
DCA
MTD 450
D
Details
Sputter - DCA Cluster - Metals
DCA
MTD 450
D
Details
Buffing tool - LCtec - LCD line
LC-tec AB
?
C
Details
Aligner & Assembler - Ciposa - LCD line
Ciposa SA
Switzerland
B
Details
Vacuum packer - LCD line
Multivac
509.5
A
Details
UV illumination box
Solectro AB
??
A
Details
Emergency diesel generator
N/A
N/A
A
Details
Glue Dispensing System - LCD line
StepCraft 210
MetCal modell DX-250.
B
Details
Evaporator - Plassys UHV
Plassys
MEB 550 SL3 - UHV
A
Details
UPS
N/A
N/A
A
Details
Gas detection alarm
Honeywell
N/A
A
Details
Steam production
N/A
N/A
A
Details
Steam boiler #1
Osby Parca
Opex-Å
A
Details
Steam boiler #2
Osby Parca
Opex-Å
A
Details
Parking spot - Hugo Grauers gata 1B
N/A
N/A
A
Details
Workshop power tools
N/A
N/A
A
Details
R211 FFU1
ZIEHL-ebm AB
GR-V 31G-4KK.2F
A
Details
Fan filter units
ZIEHL-ebm AB
GR-V 31G-4KK.2F
A
Details
Wafer Inspection System - IR
-
-
A
Details
Spinner - BLE
BLE
BLE
A
Details
Wet Bench - Acid & Base - Developer Spinner - Osiris
Osiris
Osiris BASIXX
A
Details
Mask aligner - Suss MA/BA 6 #1
Suss MicroTec
MA/BA 6
C
Details
Wet Bench - Acid & Base - Developer Work
Stangl
Wet bench
A
Details
Mask aligner - Suss MJB3 UV 400 #1
Karl Suss
MJB3
C
Details
Surface profiler - Tencor P15
KLA Tencor
P-15
B
Details
Wet Bench - Solvent - Ultrasonic bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Work - Microwave line
PM-plast
Wet bench
A
Details
Spinner - BLE & HMDS hotplate - Microwave line
PM-plast
Wet bench
A
Details
Hotplate - Solar-semi & BLE - Microwave line
PM-plast
Wet bench
A
Details
Spinner - Suss LabSpin6
Stangl
#501
A
Details
Wet bench Acid & Base - Developer work
Stangl
Wet bench
A
Details
Solar-Semi Hot Plate
Solar-Semi
Wet bench
A
Details
Furnace - Wet oxidation
Chalmers
Furnace for III/V materials
C
Details
Mask aligner - Suss MJB3 UV 400 #2
Karl Suss
MJB3
C
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Wet Bench - Hotplate & HMDS & Oven
Stangl
Stangl
A
Details
Surface profiler - Tencor AS500 #1
Tencor
AS500
B
Details
Surface profiler - Tencor AS500 #2
KLA Tencor
AS500
B
Details
Scriber breaker - Loomis
Loomis
LSD-100
B
Details
Flood exposure - Bachur & Associates - DUV
Bachur & Associates
LS 150X-5C2 500W
B
Details
Spinner - Suss RCD8
Suss
RCD8
C
Details
Hotplate - Wenesco - SU8/BCB
Wenesco
Custom
A
Details
Spinner - Suss LabSpin6
SUSS MicroTec
1116
A
Details
Mask aligner - Suss MA 6 #2
Suss MicroTec
MA6
C
Details
Maskless lithography - SmartPrint
Microlight 3D
SmartPrint
B
Details
Wafer Expander - Dynatex
Dynatex
DXE Wafer Expander
A
Details
Laminator for SUEX Dry Film Photoresist
GBC
PRO SERIES 3600
A
Details
Critical point dryer - Tousimis
Tousimis
Autosamdri 931 GL
A
Details
Ellipsometer - J.A. Woollam RC2
J. A. Woollam
RC2
C
Details
White Light Reflectance Spectroscopy (WLRS) - ThetaMetrisis
Theta Metrisis
FR-Pro-UV/VIS
A
Details
PECVD - Oxford
Oxford Instruments
Plasma Pro 100 PECVD
C
Details
Dry etch RIE - SAMCO Oxygen
SAMCO
10NR
C
Details
Dicing Saw - Disco DAD3321
Disco
3321
C
Details
CMP - LNF
Logitech
PM6
B
Details
Substrate bonder - LNF
Logitech
?
A
Details
MBE - Riber C21
Riber
Compact 21 T-E Cluster
E
Details
CMP Polishing & Lapping tool - Logitech PM5 #2
Logitech
PM5
C
Details
Dry etch RIE - Plasma-Therm - Oxygen
Plasma Therm
BatchTop RIE
C
Details
Dry etch Stripper - TePla
TePla AG
300PC
C
Details
Ozone Cleaning - FHR
FHR Anlagenbau GmbH
UVOH 150
B
Details
Scriber - Suss - Soft wafers
-
-
A
Details
Dry etch RIE - Advanced Vacuum
PlasmaTherm/Advanced Vacuum
Batchtop m/91
C
Details
Dry etch RIE - Plasma-Therm
Plasmatherm
BatchTop m/95
C
Details
MBE - EPI 930
MBE
EPI 930
E
Details
Fume Hood - Solvent - Polishing preparation
Stangl
Fume Hood
A
Details
Fume hood - Solvent - Dicing preparation
Stangl
Fume Hood
A
Details
CMP Polishing & Lapping tool - Logitech PM5 #1
Logitech
PM5
C
Details
Scriber - Suss - Hard wafers
-
-
A
Details
Dicing saw - Disco DAD3350
Disco
DAD3350
C
Details
RTP - AccuThermo AW610 - InP
Allwin21
AccuThermo AW610
C
Details
RTP - AccuThermo AW610 - Wide bandgap
Allwin21
AccuThermo AW610
C
Details
Evaporator - Lesker Spectros
Lesker
Spectros
D
Details
RTP - JIPELEC JetFirst 100
JIPELEC
JetFirst 100
C
Details
Furnace - Thermolyne - BCB cure
Barnstead Thermolyne
47900
A
Details
RTP - JIPELEC JetFirst 200
JIPELEC
JetFirst 200
C
Details
Dry etch RIBE - Oxford Ionfab 300
Oxford Plasma Technology
Ionfab 300
C
Details
Evaporator - Lesker Nano Cr
Lesker
Nano36
B
Details
Dry etch IBE - Oxford Ionfab 300 Plus
Oxford
Ionfab 300 Plus
D
Details
Evaporator - Lesker PVD 225 #1
Lesker
PVD 225
D
Details
Dry etch ICP - STS
STS
ICP MPX
D
Details
PC monitor 43"
Dell
Dell 43'' UltraSharp U4320Q 4K USB-C
A
Details
Wet Bench - Solvent - Chemical preparation
Stangl
-
A
Details
Wet Bench - Acid & Base - Chemical preparation
Stangl
0
A
Details
Substrate bonder - Suss SB6
-
-
C
Details
RTP - STEAG
Steag
SHS 100M
C
Details
Intercom Set 1, black
Eartec
UltraLITE UL5S HD Kit
A
Details
MCC115 PL1 Group 1
Chalmers
1
A
Details
MCC115 PL1 Group 2
Chalmers
2
A
Details
MCC115 PL2 Group 1
Chalmers
3
A
Details
Intercom Set 2, yellow
Eartec
UltraLITE UL5S HD Kit
A
Details
Dry etch RIBE - NILT
Oxford Instruments
Ionfab
D
Details
SEM - Zeiss Supra 55 - EDX
Zeiss
Supra 55 VP
C
Details
SPM - Bruker Dimension 3100
Bruker
Dimension 3100 SPM
C
Details
SEM - Zeiss Supra 60 VP - EDX
Zeiss
Supra 60 VP
C
Details
Spectrometer EDX - IXRF
IXRF
-
B
Details
Software - SPM/AutoCAD
HP
140
B
Details
EBL - Raith EBPG 5200
Raith
EBPG 5200
E
Details
Microscope Automatic - Nikon L200ND
Nikon
L200ND
B
Details
Process cooling water
N/A
N/A
A
Details
Process cooling, loop 1
N/A
N/A
A
Details
Process cooling, loop 3
N/A
N/A
A
Details
Process cooling, loop 4
N/A
N/A
A
Details
Process cooling, loop 5
N/A
N/A
A
Details
Process cooling, loop 6
N/A
N/A
A
Details
Chip scanner - Raith
Raith
Chip Scanner Two-HS
C
Details
EBL Sample pre-aligner
Chalmers MC2
PAMS 1101
A
Details
EBL - JEOL JBX 9300FS
JEOL Ltd.
JBX9300FS
E
Details
Dry etch ICP - Oxford PlasmaPro 100
Oxford Instruments
PlasmaPro 100 Cobra ICP 180
D
Details
ALD - Oxford FlexAl
Oxford Instruments
FlexAl
C
Details
Laser writer - DWL 2000
Heidelberg Instruments
DWL 2000
C
Details
Dry Etch ICP - Oxford - Deep Silicon etch
Oxford Instruments
Plasma Pro 100
D
Details
Sputter - HHV UHV
HHV
?
D
Details
Dry etch ICP - Oxford PlasmaPro 100 Cl2
Oxford
PlasmaPro 100
D
Details
Laser Writer - MLA 150
Heidelberg Instruments
MLA 150
D
Details
Tripod
Samsung
S10
A
Details
Dry etch ICP - Oxford Plasmalab 100 - Two chambers
Oxford Plasma Technology
Plasmalab 100 ICP180
D
Details
CVD - Aixtron - Graphene
Aixtron
BM HT Pro 2-inch
C
Details
Furnace - Graphene SiC
Graphensic
-
B
Details
CVD - MTI - Graphene
MTI Corporation
OTF-1200X-4-II-C4OV-SL
A
Details
CVD - Aixtron - CNT
Aixtron
Black Magic 2-inch
C
Details
Furnace - Lenton
Lenton
AWF 12/65
A
Details
Furnace - Centrotherm #3-2 Low temp anneal
Centrotherm
Au anneal
B
Details
Furnace - Centrotherm #3-3 High temp anneal
Centrotherm
Hi temp anneal
B
Details
Furnace - Centrotherm #1-1 Oxidation (restricted)
Centrotherm
Dry oxidation
B
Details
Furnace - Centrotherm #1-2 Wet & dry oxidation (public)
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #1-3 Wet & dry oxidation
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #4-2 LPCVD - TEOS
Centrotherm
LP-TEOS
C
Details
Furnace - Centrotherm #4-3 LPCVD - SiN
Centrotherm
LPCVD Furnace
C
Details
Furnace - Centrotherm #4-4 LPCVD - Polysilicon
Centrotherm
LP-Polysilicon
C
Details
Furnace - Thermolyne - Open Tube/1600°C
Barnstead/Thermolyne
Thermolyne- M. 59340
B
Details
CVD - MTI - 2D materials
MTI
-
B
Details
Film stress measurement
KLA Tencor
FLX 2320
B
Details
Furnace - Tempress #2-2 LPCVD - TEOS
Tempress
?
C
Details
Furnace - Tempress #2-3 LPCVD - SiN
Tempress
?
C
Details
Furnace - Tempress #2-1 LPCVD - Polysilicon
Tempress
?
C
Details
Developer Spinner - Osiris UNIXX
Osiris
UNIXX D20
B
Details
SEM - Zeiss Gemini 560
Zeiss
Gemini 560
A
Details
SEM- Zeiss Sigma 360
Zeiss
Sigma 360
A
Details
Dry Release Etch - Vapor HF Etcher - KLA
??
??
C
Details
Microtransfer printer
XDisplay
MTP-1002
B
Details
Flip-Chip Bonder
FineTech
Fineplacer Femto 2
D
Details
Surface profiler - Sensofar neox - Optical
Sensofar
Neox 3D
C
Details
Electrochemical etching station
?
?
A
Details
Dry Release Etch - XeF2 - Memstar
Memstar
ORBIS ALPHA
C
Details
Mobile phone
Samsung
S10
A
Details
Wet Bench - Acid & Base - BOE bath
Stangl
Wet bench
A
Details
Nanoimprint - CNI v2
NILT
CNI
B
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent
Stangl
Wet bench
A
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Parameter Analyzer - Keithley 4200SCS
Keithley
4200-SCS
B
Details
Wet Bench - Acid & Base - Developer Work
Stangl
Wet bench
A
Details
4-point probe - CMT SR2000N
AIT
CMT-SR2000N
B
Details
Vacuum oven - Hereaus
Hereaus
#500
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base - Electroplating
Stangl
Wet bench
B
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Liftoff Bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Megasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Mask cleaning
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base - Standard Clean baths (SC1/SC2)
Stangl
Wet bench
B
Details
Wet Bench - Acid & Base - Al-etch bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Remover Bath
Stangl
Wet bench
A
Details
Fume Hood - Acid & Base - HF & BOE Work
Stangl
Fume Hood
A
Details
Fume Hood - Acid & Base - PLD target polishing
Stangl
Fume Hood
A
Details
Fume Hood - Acid & Base - Wash-up
Stangl
Fume Hood
A
Details
Vacuum sealer
AirZero
AZ-450
A
Details
CVD - Parylene
SCS
PDS 2010 Labcoter
A
Details
Raman microscope - Horiba
Horiba
XploRA
B
Details
Spinner - Polos & hotplates - Unconventional resists
Polos + BLE
Polos + Delta200_Hotplates
A
Details
Wet Bench - Solvent - Development work & Hot Plate
Stangl + BLE
Wet bench
A
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Wet Bench - Solvent - Developer Work
Stangl
Wet bench
A
Details
Fume Hood - Solvent
Stangle
Fume Hood
A
Details
Fume Hood - Acid & Base - Hot Acid Work
Stangl
Fume Hood
A
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Microscope - Olympus MX40 - III/V area
Olympus
MX40
A
Details
Microscope - Olympus MX40
Olympus
MX40
A
Details
Microscope stereo - Olympus SZX-12
Olympus
SZX-12
A
Details
Microscope - Olympus MX50 - III/V area
Olympus
MX50
A
Details
Microscope - Olympus MX40 - Silicon area
Olympus
MX40
A
Details
Microscope - Olympus MX50 - Metrology area
Olympus
MX50
A
Details
Microscope stereo - Olympus SZH-11
Olympus
SZH-10
A
Details
Microscope - Olympus BX52
Olympus
BX51
A
Details
Microscope stereo - Olympus SZX-9 - PL2
Olympus
SZX-9
A
Details
Boron trichloride (BCl3)
N/A
N/A
A
Details
Hydrogen 5% in argon (H2/Ar)
N/A
N/A
A
Details
House vacuum system
N/A
N/A
A
Details
Compressed Dry Air
N/A
N/A
A
Details
Argon (Ar)
N/A
N/A
A
Details
Silane 5% (SiH4)
N/A
N/A
A
Details
Fluorine 5% (F)
N/A
N/A
A
Details
Process gases
N/A
N/A
A
Details
Solvent waste tank
N/A
N/A
A
Details
Diborane 5% (B2H6))
N/A
N/A
A
Details
Methane 5% (CH4)
N/A
N/A
A
Details
Acetylene (C2H2)
N/A
N/A
A
Details
Octafluorocyclobutane (C4F8)
N/A
N/A
A
Details
Tetrafluoromethane (CF4)
N/A
N/A
A
Details
Methane (CH4)
N/A
N/A
A
Details
Trifluoromethane (CHF3)
N/A
N/A
A
Details
Chlorine (CL2)
N/A
N/A
A
Details
Carbon dioxide (CO2)
N/A
N/A
A
Details
Hydrogen (H2)
N/A
N/A
A
Details
Hydrogen bromide (Hbr)
N/A
N/A
A
Details
Helium (He)
N/A
N/A
A
Details
Krypton (Kr)
N/A
N/A
A
Details
Nitrous oxide (N2O)
N/A
N/A
A
Details
Neon (Ne)
N/A
N/A
A
Details
Nitrogen trifluoride (NF3)
N/A
N/A
A
Details
Ammonia (NH3)
N/A
N/A
A
Details
Oxygen (O2)
N/A
N/A
A
Details
Sulfur hexafluoride (SF6)
N/A
N/A
A
Details
Silicon tetrachloride (SiCl4)
N/A
N/A
A
Details
Dichlorosilane (SiH2Cl2)
N/A
N/A
A
Details
Silane LPCVD (SiH4)
N/A
N/A
A
Details
Silane Oxford (SiH4)
N/A
N/A
A
Details
Process cooling, loop 7
N/A
N/A
A
Details
Di water, loop 1
N/A
N/A
A
Details
Di water, loop 2
N/A
N/A
A
Details
Di water, loop 3
N/A
N/A
A
Details
Di water, loop 4
N/A
N/A
A
Details
Wet scrubber, acid/base
Colasit
N/A
A
Details
Neutralization waste tank
N/A
N/A
A
Details
Fan exhaust systems, floor 9
N/A
N/A
A
Details
Di water
N/A
N/A
A
Details
Wet scrubbers
N/A
N/A
A
Details
Solvent exhaust FF01, floor 9
N/A
N/A
A
Details
Acid/base exhaust FF02, floor 9
N/A
N/A
A
Details
Poisonous exhaust FF03-04, floor 9
N/A
N/A
A
Details
Wet scrubber, poisonous
Colasit
N/A
A
Details
Vacuum oven - Polyimide
Yield Engineering Systems
YES-PB6
A
Details
PECVD - Smoltek - Remote plasma
DCA
?
C
Details
TA07
N/A
N/A
A
Details
Air treatment
N/A
N/A
A
Details
TA01
N/A
N/A
A
Details
TA02
N/A
N/A
A
Details
TA03
N/A
N/A
A
Details
TA04
N/A
N/A
A
Details
TA05
N/A
N/A
A
Details
TA06
N/A
N/A
A
Details
CA01
N/A
N/A
A
Details
CA02
N/A
N/A
A
Details
CA03
N/A
N/A
A
Details
CA04
N/A
N/A
A
Details
CA05
N/A
N/A
A
Details
CA06
N/A
N/A
A
Details
CA07
N/A
N/A
A
Details
CA08
N/A
N/A
A
Details
CA09
N/A
N/A
A
Details
Circulating fans
N/A
N/A
A